DRK8090 Photoelectric Profiler

This instrument adopts non-contact, optical phase-shifting interferometric measurement method, does not damage the surface of the workpiece during measurement, can quickly measure the three-dimensional graphics of the surface micro-topography of various workpieces, and analyze.

Products Details

This instrument adopts non-contact, optical phase-shifting interferometric measurement method, does not damage the surface of the workpiece during measurement, can quickly measure the three-dimensional graphics of the surface micro-topography of various workpieces, and analyze and calculate the measurement results. Product Description Features: Suitable for measuring the surface roughness of various gauge blocks and optical parts; the depth of the reticle of the ruler and the dial; the thickness of the coating of the grating groove structure and the structure morphology of the coating boundary; the surface of the magnetic (optical) disk and the magnetic head Structure measurement; silicon wafer surface roughness and pattern structure measurement, etc. Due to the high measurement accuracy of the instrument, it has the characteristics of non-contact and three-dimensional measurement, and adopts computer control and rapid analysis and calculation of measurement results. This instrument is suitable for all levels of testing and measurement research units, industrial and mining enterprise measurement rooms, precision processing workshops, and also suitable for Institutions of higher learning and scientific research institutions, etc. The main technical parameters Measuring range of surface microscopic unevenness depth On a continuous surface, when there is no height abrupt change greater than 1/4 wavelength between two adjacent pixels: 1000-1nm When there is a height mutation greater than 1/4 of the wavelength between two adjacent pixels: 130-1nm Repeatability of measurement: δRa ≤0.5nm Objective lens magnification: 40X Numerical aperture: Φ 65 Working distance: 0.5mm Instrument field of view Visual: Φ0.25mm Photograph: 0.13×0.13mm Instrument magnification Visual: 500× Photograph (observed by computer screen)-2500× Receiver measurement array: 1000X1000 Pixel size: 5.2×5.2µm Measurement time sampling (scanning) time: 1S Instrument standard mirror reflectivity (high): ~50% Reflectance (low): ~4% Lighting source: incandescent lamp 6V 5W Green interference filter wavelength: λ≒530nm Half width λ≒10nm Main microscope lift: 110 mm Table lift: 5 mm Range of movement in X and Y direction: ~10 mm Rotational range of worktable: 360° Tilt range of working table: ±6° Computer system: P4, 2.8G or more, 17-inch flat-screen display with 1G or more memory

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